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专利名称：Position control system, a lithographic
apparatus and a method for controlling aposition of a movable object
发明人：Michael Johannes Vervoordeldonk,Mark
Constant Johannes Baggen
申请号：US12426125申请日：20090417公开号：US08279401B2公开日：20121002
专利附图：
摘要：A position control system configured to control the position of a movable
object, includes: a position measurement system configured to determine a position of asensor or sensor target on the movable object, a comparator configured to provide anerror signal by comparing a set-point position and a position feed-back signal based onthe measured position, a controller to provide a control signal based on the error signal,a feed-forward device to provide a feed-forward signal on the basis of a first signalrelated to the desired position, and one or more actuators configured to act on themovable object based on the control signal and the feed-forward signal, wherein theposition control system further includes a compliance compensation device providing acompliance compensation signal, wherein the compliance compensation signal is
subtracted from a measured position of the position measurement system to obtain thefeed-back position signal.
申请人：Michael Johannes Vervoordeldonk,Mark Constant Johannes Baggen
地址：Rosmalen NL,Eindhoven NL
国籍：NL,NL
代理机构：Pillsbury Winthrop Shaw Pittman LLP
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